ApexRp is a high‑performance airborne particle counter designed for cleanroom and GMP‑regulated environments. With a self‑contained vacuum pump, and built‑in HEPA‑filtered exhaust – this system offers continuous real‑time monitoring without compromising your controlled space. ApexRp models are available with either 0.1 CFM or 1.0 CFM airflow rates
ApexRp provides real-time continuous data collection at a cost-effective price per point offering. It is best in class for data integrity, data availability, and environmental compatibility. Whether you’re monitoring a critical pharmaceutical classification or an ISO‑rated cleanroom, the ApexRp ensures a seamless, integrated solution for air quality oversight
ApexRp seamlessly integrates into existing facility monitoring systems (FMS) or building automation systems (BAS) for real-time data streaming, enabling prompt responses to any deviations from set parameters.
The ApexRp offers an internal HEPA filter traps >99.97% of particles ≥0.3 µm, ensuring the exhaust doesn’t compromise your controlled environment. Without filtration, this exhaust could reintroduce or spread particles back into the cleanroom.
Effortlessly and securely store up to 3,000 particle count records. ApexRp provides real-time continuous data collection at a cost-effective price per point, ensuring unmatched performance, accuracy, and reliability.
Housed in a 304 stainless steel enclosure and compatible with rigorous decontamination methods—including vaporized hydrogen peroxide (VHP) sterilization—the ApexRp is ready for the most demanding environments.
| Minimum Size | 0.3 µm |
|---|---|
| Two Channel Sizes | 0.3 µm | 0.5 µm |
| Four Channel Option | 0.3 µm | 0.5 µm | 1.0 µm | 5.0 µm |
| Flow Rate | 1 CFM (28.3 LPM), 3/8” inlet |
| Dimensions | 6.65”(h) x 9.13”(w) x 4.75”(d) |
| Weight | 6.3 lbs (2.9 kg) |
| Minimum Size | 0.5 µm |
|---|---|
| Two Channel Sizes | 0.5 µm | 5.0 µm |
| Four Channel Option | 0.5 µm | 1.0 µm | 5.0 µm | 10.0 µm |
| Flow Rate | 1 CFM (28.3 LPM), 3/8” inlet |
| Dimensions | 6.65”(h) x 9.13”(w) x 4.75”(d) |
| Weight | 6.3 lbs (2.9 kg) |
| Minimum Size | 5.0 µm |
|---|---|
| Two Channel Sizes | N/A |
| Four Channel Option | 5.0 µm | 10.0 µm | 50.0 µm | 100.0 µm |
| Flow Rate | 1 CFM (28.3 LPM), 3/8” inlet |
| Dimensions | 6.65”(h) x 9.13”(w) x 4.75”(d) |
| Weight | 6.3 lbs (2.9 kg) |
| Minimum Size | 0.2 µm |
|---|---|
| Two Channel Sizes | 0.2 µm | 0.3 µm |
| Four Channel Option | 0.2 µm | 0.3 µm | 0.5 µm | 1.0 µm |
| Flow Rate | 0.1 CFM (2.83 LPM), 1/8” inlet |
| Dimensions | 4.87”(h) x 6.50”(w) x 3.26”(d) |
| Weight | 3.1 lbs (1.4 kg) |
| Minimum Size | 0.3 µm |
|---|---|
| Two Channel Sizes | 0.3 µm | 0.5 µm |
| Four Channel Option | 0.3 µm | 0.5 µm | 1.0 µm | 5.0 µm |
| Flow Rate | 0.1 CFM (2.83 LPM), 1/8” inlet |
| Dimensions | 4.87”(h) x 6.50”(w) x 3.26”(d) |
| Weight | 3.1 lbs (1.4 kg) |
| Minimum Size | 0.5 µm |
|---|---|
| Two Channel Sizes | 0.5 µm | 5.0 µm |
| Four Channel Option | 0.5 µm | 1.0 µm | 5.0 µm | 10.0 µm |
| Flow Rate | 0.1 CFM (2.83 LPM), 1/8” inlet |
| Dimensions | 4.87”(h) x 6.50”(w) x 3.26”(d) |
| Weight | 3.1 lbs (1.4 kg) |
Contaminants in argon can affect its inertness, leading to unwanted reactions in processes where argon is used to create a stable, non-reactive environment. This is crucial in applications like shielding gases in welding or inert atmospheres in metal manufacturing.
Due to its small atomic size, helium is highly sensitive to particle contamination. Contaminants can affect its efficacy as a cooling medium in cryogenics and its purity in gas chromatography, impacting the accuracy and efficiency of these processes.
Particle contaminants in CO2 can affect its properties as a supercritical fluid, impacting its use in extraction and cleaning processes. In applications where CO2 is used for carbonation or as a refrigerant, purity is essential for both product quality and process efficiency.
Nitrogen is often used for creating inert atmospheres in various industries. Particle contaminants in nitrogen can introduce impurities into these processes, affecting everything from the quality of pharmaceutical products to the integrity of electronic components in semiconductors
In semiconductor manufacturing, impurities in ammonia can lead to defects in nitride films, affecting the performance of electronic devices. In chemical synthesis, contaminants can alter reaction pathways, leading to undesired products or yields.
Other Inert Gases Inert gases like neon, xenon, and krypton are used in specialized applications where their specific properties are crucial. Particle contaminants can alter these properties, thereby affecting the performance in applications like lighting, imaging, or as carrier gases.
We’ve got the answers.
The Mass Concentration Mode approximates particle density in μg/m3, providing valuable data for indoor air quality assessments.
Yes, these devices can function as mobile monitors or be incorporated into comprehensive facility monitoring and management systems.
The counters offer historical data review, password protection, and compatibility with LMS XChange Data Transfer Software and LMS Express for advanced data management.
They are designed for ISO 21501-4 compliance, ensuring unit-to-unit accuracy and repeatability in measurements.
The devices feature removable rechargeable Li-Ion batteries and offer an optional charger to maximize uptime during prolonged monitoring sessions.
ApexRp… precision, reliability, and a team who always has your back. You’re not just getting equipment; you’re teaming up with folks who care about your cleanroom’s success.
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